Thin Film Fabrication

ATC Orion 5 RF/DC Sputtering System (AJA International)

Sputtering System

Features:

  • Main Deposition Chamber:听14.6" high x 12" OD, S/S vacuum chamber.

  • Con-Focal Sputtering:听three 2'' magnetron sputter guns with integral isolation chimneys.

  • DC and RF Generators:听two 300 Watt RF generators and one 750 Watt DC generator.

  • Quartz Crystal Thickness Monitor.

  • Substrate Holder:听accommodates substrates up to 4" diameter; mounts to top of chamber for sputter up orientation; continous motorized rotation (0-40RPM) with controller; radiant heating to 850 C with quartz halogen lamps (+/- 1 degree C temp. stability); capable of being heated in an O2 environment;

  • Gas Handling:听mass flow controlled gas line (Ar) - 20 sccm with pneumatic isolation valve(s) and filter.

  • Deposition Uniformity:听typically +/- 2.5% thickness uniformity over a 4'' diameter substrates.

  • Base Chamber Vacuum:听better than or equal to 3.0脳10-8 Torr.

Savannah 100 ALD (UltraTech / Cambridge NanoTech)

Savannah 100 ALD

Features:

  • Substrate Size:听up to 200 mm

  • Substrate Temperature:听25掳C - 500掳C; 卤0.2掳C

  • Precursor Sources:听Up to 6, heated

  • Deposition Uniformity:听&濒迟;卤1%

  • Deposition:听High speed/ultra high aspect ratio

  • Control:听尝补产惫颈别飞-鲍厂叠-笔颁

UHV PLD System

UHV PLD System

Thermal Evaporation System

3118 E-beam evaporator (Varian)

3118 E-beam evaporator (Varian)